PVD Deposition Systems
Ion Assistant Deposition Systems
Vacuum Chamber:
Electro polished 304 stainless steel front door open Vacuum Chamber.
Chamber is having 2 Nos. View Ports of 4” Size and 1 set of inside shield.
Chamber is water Cooled.
Vacuum pumping System:
- A Dry Vacuum Pump of suitable capacity and capable of achieving ?5×10-3torr vacuum
- A CRYO Pump and suitable Compressor for Cryo Pump or Turbo Molecular Pump.
- Rough Valve, Foreline Valve and Main Gate Valve along with Vent Valve and Cryo Pump Purge valve provided in the system with suitable plumbing Line.
- Pfeiffer Make Guages are provided for Vacuum Measurement
Features:
- Four target pockets
- Quartz crystal monitor for closed loop thickness control
- Planetary substrate rotation system
- 6 kW Power Supply, 10kW/15kW option
- Uses Cryo-pump for rapid pump down
- X-Y sweep supply
- Automated process operation
- 10-7Torr Ultimate vacuum
Options:
- Substrate rotation
- Substrate heating available 300°C, 500°C
- Choice of Cryo/Diffusion Pump / Turbo Pump available
- Ion Source for Ion Assisted Deposition
Applications:
Chamber pumping performance:
- Ultra-pressure:? 3 ×10-7 Torr
- Film uniformity:? ±5% (across 3 inch wafer)
- Base pressure:? 5×10-6 Torr (within 30 min,Main valve open )
Control system:
- PC Base + PLC + Touch monitor
- Fully PC-based automatic operation with full manual override.
- Easy-to-use computerized touch panel for parameter control and recipe entry/storage.
- Authorities enactment with user name and password control.
- Safety mechanism (Interlock Mechanism).
- Recipes, historical storage.